X-ray lithography — Implemented through a proximity printing approach and relies on near-field X-rays in Fresnel diffraction. It is known to extend its optical resolution to 15 nm.
Double patterning — A method used to increase the pitch resolution of a lithographic process by printing additional patterns between spaces of already printed patterns in the same layer.
Electron-beam direct-write (EBDW) lithography — The most common process used in lithography, which uses a beam of electrons to create patterns.
Extreme ultraviolet (EUV) lithography — A form of optical lithography that makes use of ultrashort light wavelengths of 13.5 nm.
